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Chemical Reaction Engineering Chemical Reaction Engineering

Chemical Reaction Engineering - PowerPoint Presentation

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Chemical Reaction Engineering - PPT Presentation

CRE is the field that studies the rates and mechanisms of chemical reactions and the design of the reactors in which they take place Lecture 18 Web Lecture 18 Class Lecture 23 Tuesday 452011 ID: 640858

chemical reaction surface adsorbed reaction chemical adsorbed surface sites lecture rate water dme vapor initially balance conversion area engineering terms resist step

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Slide1

Chemical Reaction Engineering (CRE) is the field that studies the rates and mechanisms of chemical reactions and the design of the reactors in which they take place.

Lecture 18Slide2

Web Lecture 18Class Lecture 23 – Tuesday 4/5/2011

Catalytic Mechanisms

Data Analysis

Chemical Vapor Deposition

2Slide3

(a)  The initial rate of reaction is shown below           (A)                       (B)

                            

(C)

3Slide4

4Slide5

5Slide6

6Slide7

7Slide8

8

Where K

A

= 4

atm

–1

and K

C = 6

atm–11) At what is the ratio of sites with A adsorbed to those sites with C adsorbed when the conversion is 50%?

2) What is the conversion when the sites with A adsorbed are equal to those with C adsorbed?Slide9

9Slide10

10

1) At X = 0.5

2) At an equal concentrations of A and C sites, the conversion will be Slide11

Dimethyl

Either

11

Initially water does not exit the reactor the same as DME because

Which of the following best describes the data

A

There is more DME than water.

B

Steady state has been reached.

C

Water reacts with ME.

D

Water is adsorbed on the surface.Slide12

Dimethyl

Either

12

Which of the following are true

The concentration of DME reaches a maximum because

A

the rate of reaction is very rapid initially.

B

all the sites are vacant initially so that (Methanol) ME is rapidly adsorbed.

C

there is very little water initially adsorbed on the surface.

D

DME is probably not on the surface.Slide13

Chemical Reaction Engineering in the Electronics Industry Slide14

Chemical Reaction Engineering in the Electronics Industry

ChE

342

Czochralski

Crystal Growth – Heat Transfer

Doping of n/p junction – DiffusionChE 344

Chemical Vapor Deposition (Catalysis Analogy) Photo Resist Formation Photo Resist Dissolution EtchingThe 5 steps 1. Postulate Mechanism (sometimes first includes a gas phase reaction( then adsorption, surface reaction and desorption)

2. Postulate Rate Limiting Step 3. Evaluate Parameters in Terms of Measured Variables 4. Surface Area Balance 5. Evaluate Rate Law ParametersSlide15

15Slide16

16

Chemical Vapor

DespositionSlide17

17Slide18

Chemical Vapor

Desposition

18

1) Mechanism

Gas Phase

Homogeneous

HeterogeneousSlide19

19

2) Rate Limiting Step

3) Express

f

i

in terms of P

i

4) Area BalanceSlide20

20

4) Area Balance

5) CombineSlide21

21

Homogeneous ReactionSlide22

End of Web Lecture 18

End of Class Lecture 23

22