PPT-Image Sensor Design and Technology Development at
Fraunhofer IMS Dr Sascha Weyers Fraunhofer IMS Infrastructure CMOS Fab Total a rea 1300 m 2 Clean room c lass 10 Wafer size 200 mm 8 inch 035 µm Staff working in
Download Presentation
Download Note : "Image Sensor Design and Technology Development at" is the property of its rightful owner. Permission is granted to download and print materials on this website for personal, non-commercial use only, provided you retain all copyright notices. By downloading content from our website, you accept the terms of this agreement.
Presentation Transcript
Transcript not available.