PPT-Image Sensor Design and Technology Development at
Fraunhofer IMS Dr Sascha Weyers Fraunhofer IMS Infrastructure CMOS Fab Total a rea 1300 m 2 Clean room c lass 10 Wafer size 200 mm 8 inch 035 µm Staff working in
Download Presentation
"Image Sensor Design and Technology Development at" is the property of its rightful owner. Permission is granted to download and print materials on this website for personal, non-commercial use only, provided you retain all copyright notices. By downloading content from our website, you accept the terms of this agreement.
Presentation Transcript
Transcript not available.