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Pixel Chamber m PIC with resistive cathode amp capacitive readout Atsuhiko Ochi Kobe University 9 th RD51 meeting CERN 21st February 2012 The m PIC is now quite stable ID: 235357

2012 resistive meeting rd51 resistive 2012 rd51 meeting feb 9th ochi pic surface cathode anode cathodes capacitive readout prototype

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Slide1

Micro Pixel Chamber (m-PIC) with resistive cathode & capacitive readout

Atsuhiko OchiKobe University

9

th

RD51 meeting

@

CERN

21st February, 2012Slide2

The m-PIC is now quite stableBy improvement of the productionHowever, more stabilities and robustness is needed for some applicationOperation in heavy ionized particle

Very high gain for detecting single electron The electron density may excess the R

aether

limit (107-8)Continuous sparks will destroy the electrodes easily because of existence of substrates near electrodes.Dead time due to resuming HV is also problem.For muon detector in the LHC (HL-LHC) detector, those stability studies are very important!There are two approaches for stable operationReducing the sparkMaking spark tolerant structureNew IdeaSelf quench mechanism for sparks will be added, using MPGD (m-PIC) electrodes1st trial: Metal cathodes are covered by high resistivity material.This report: Cathodes are made from resistive material, and cathode signals are read using induced charge.

Requirements for more stability

A. Ochi 9th RD51 meeting

21 Feb 2012Slide3

First trial: m-PIC with resistive overcoatResistive kapton

is on the cathodes of m-PIC.Large current from spark reduce the e-field, and spark will be quenched.

Huge signal beyond the “

Raether limit” will also be suppressedSignal from low energy deposit will observed with higher gas gainThis design provide one promising possibility of MIP detector under hadronic backgroundRR

R

+HV

100

m

m

25

m

m

Cathode

Resistive sheet

An

ode

400

m

m

Drift plane

-

HV

~1cm

Detection area

: filled by gas

25μm

25μm

Anode

Resistive

film

Cathode

E-field will be dropped by spark current.

A. Ochi 9th RD51 meeting

21 Feb 2012Slide4

Setup for first prototypeVd = 2kV (2kV/cm)Vac = 500 – 620VGas: Ar+C2H6 = 1:1

10cm x 10cm

A. Ochi 9th RD51 meeting

10cm400

mm

21 Feb 2012Slide5

Improvements for production

10cm

First prototype

Sparks on cracks

4th prototype

Cracks are on substrate

No crack, but

bad quality

5

th

prototype

Qualities are

getting better

A. Ochi 9th RD51 meeting

Signal can be found, but slightly

improvements for stability was found.

21 Feb 2012Slide6

Remnant problems and new design

Sparks are still occurred on resistive

m

-PICMore precise manufacturing are neededProblems for alignment of anode and cathode position Dual page mask + liquid resistive captonDual page mask  Both anodes and cathode images are printed simultaneouslyTo make higher resistivity between anodes and cathodesNew structure using capacitive readout from cathodes.

(Thanks to R. Olivaira)Spark will be suppressed more

strong

A. Ochi 9th RD51 meeting

First

resistive

m

-PIC

New resistive

m

-PIC

Connect to one pad

R

+HV(~500V)

R

(0V

)

Capacitive readout

For second coordination

21 Feb 2012Slide7

Start

from

PI

film with

cupper layer

Nickel plating on top

Double side photo exposure

Double side etching

PI etching from bottom

Cu pattern etching (second coordinate)

Prototype production process

for

new resistive

m

-PIC (

Raytech

inc.

)

A. Ochi 9th RD51 meeting

Polyimide (25mm)

Cupper

Ni

Photo mask

21 Feb 2012Slide8

SPB (50um)

Anode post plating with Nickel

Surface etching ( cathode pattern )

Resistive polyimide coating and baking

Grinding a surface resistive polyimide and attaching bottom substrate

Production process (cont’d)

A. Ochi 9th RD51 meeting

PI (50um)

21 Feb 2012Slide9

Making holes from bottom using laser drillingHole plating after Cu spatter

Etching the surface metal. Top of anodes and resistive cathodes are remained on surface.

Production process (cont’d)

A. Ochi 9th RD51 meeting

21 Feb 2012Slide10

Delivered at 8th Feb, 2012 from RaytechThis is second trial for capacitive readoutAnode pixel is well aligned at center of cathode

10cm x 10cm (400 micron pitch) has been producedTwo samples were producedSurface resistivity (mean of all surface) :0.7MW

1.2M

WSurface picture of a prototypeA. Ochi 9th RD51 meeting21 Feb 2012Slide11

Only one of two sample provides signals using 55Fe.Gas: Ar+C2H6 = 7:3Sparks are found because of parasite holes of anode pixels. (next slide.)

Operation tests (very2 preliminary)

A. Ochi 9th RD51 meeting

Cathode signals21 Feb 2012(Trigger from anode signals)Slide12

There found parasite holes …Laser drilling for anode pixels are not in right place due to deformation of the substrate.At the surface resistive polyimide baking.We need more improvements of process.

Problems

A. Ochi 9th RD51 meeting

Parasite hole

21 Feb 2012Slide13

m-PIC with resistive cathodes and capacitive readout is newly developed.We confirmed a operation principlyThe 55Fe signals are

read from both anodes and capacitive readouts.There remain some problems in production process.To improve the quality of production, we are considering following methods

Changing surface resistive materials

Some other organic material, or very thin metal layer, without baking for fixing it.Considering the process for makingNew operation condition with applying HV to resistive cathodeThere are no HV on anode  No coupling capacitor is needed for anode readoutSummary and future prospectsA. Ochi 9th RD51 meeting

(0V

)

R

+HV(~500V)

New resistive

m

-PIC

-HV(~-500V

)

Direct connection to readout

21 Feb 2012