/
Layout design rules Layout design rules

Layout design rules - PowerPoint Presentation

luanne-stotts
luanne-stotts . @luanne-stotts
Follow
420 views
Uploaded On 2017-05-18

Layout design rules - PPT Presentation

2 Introduction Layout rules is also referred as design rules It is considered as a prescription for preparing photomasks Provides a link between circuit designer and processor engineer ID: 549528

design rules minimum layout rules design layout minimum contact micron size mask transistor fabrication feature processes based circuit inverter

Share:

Link:

Embed:

Download Presentation from below link

Download Presentation The PPT/PDF document "Layout design rules" is the property of its rightful owner. Permission is granted to download and print the materials on this web site for personal, non-commercial use only, and to display it on your personal computer provided you do not modify the materials and that you retain all copyright notices contained in the materials. By downloading content from our website, you accept the terms of this agreement.


Presentation Transcript

Slide1

Layout design rulesSlide2

2

Introduction

Layout rules is also referred as design rules.

It is considered as a prescription for preparing

photomasks

.

Provides a link between

circuit designer

and

processor engineer

during manufacturing phase.

Design rules specify

geometric constraints

on the layout artwork.

Objective:

To obtain a circuit with optimum yield.

To minimize the area of the circuit.

To provide long term reliability of the circuit.

Design rules represent the best compromise between performance and yield:

More conservative rules increase yield.

More aggressive rules increase performance

.

Design rules represent a

tolerance

that ensures high probability of correct fabrication - rather than a hard boundary between correct and incorrect fabrication.Slide3

3

Layout or Design Rules

Two approaches to describing design rules:

Lambda-based rules

: Allow first order scaling by linearizing the resolution of the complete wafer implementation.

To move a design from 4 micron to 2 micron, simply reduce the value of lambda.

Worked well for

4

micron processes down to

1.2

micron processes.

However, in general, processes rarely shrink uniformly.

Probably not sufficient for submicron processes.

Micron rules

: List of minimum feature sizes and spacings for all masks, e.g., 3.25 microns for contact-poly-contact (transistor pitch) and 2.75 micron metal 1 contact-to-contact pitch.

Stated at some micron resolution, alpha(

) and beta (

) rules. Basic feature size is defined in terms of

while minimum grid size is described by

.

and

may related by a constant factor.

Normal style for industry.Slide4

4

Layout or Design RulesSlide5

5

Lambda-based p-well rules

These rules are only

representative

and are the result of

averaging

a large number of processes.

The rules are defined in terms of:

Feature sizes

Separations and overlaps.Slide6

6

Mask No. 1:ThinoxSlide7

7

Mask No. 2: P-wellSlide8

8

Mask No. 3: PolySlide9

9

Mask No 4: P-plusSlide10

10

Mask No 5: ContactSlide11

11

Mask No 5: ContactSlide12

12

Contact No 6: MetalSlide13

13

CMOS Design Rules

A layout resembles the top view of the IC

The layout design is 2-dimentional from the viewpoint of an IC designer.

in fact, designers normally do not control the depth dimension of an IC. The depth of a transistor source or the thickness of a metal wire is determined by the fabrication process.

The layout designer only decides the dimensions and locations of the transistors and interconnects them into the target circuit.

The

minimum feature size

of a technology is typically denoted by the

narrowest

width of a

polysilicon

wire that it can produce.

For instance, if the narrowest polysilicon wire in a technology is 1

m wide, it is called 1

m technology.

Design rules capture the physical limitations of a fabrication process.

Design rules release designers from the details of fabrication so they can concentrate on the design instead.Slide14

14

CMOS Design Rules

In

-based design rules (developed by Mead and Conway) the minimum feature size is 2

.

For a 2

m technology,

=1

m

m

Different fabrication technologies apparently require different rules.

Drawbacks of scalable design rules: the layout produced according to scalable design rules are often larger than necessary.

For example, a minimum spacing of 4

m may be ordered although in reality 3.2

m is sufficient.Slide15

15

MOSIS Design rules

Scalable

-based design rules are used in MOSIS projects.

http//:www.mosis.org

A subset of MOSIS scalable CMOS (SCMOS) design rules is used to provide an overview of their use.Slide16

16

Layout Examples

Example 1: symbolic layout for and inverter

According to

-based design rules, the smallest transistor channel is

2

long

and

3

wide

(the minimum width of diffusion region). However, in the following figure the width of transistor has been increased to 4

so that a diffusion contact (4

X 4

required) can be readily made. This

2

X 4

transistor is referred as the

minimum size transistor

.

An inverter formed of minimum size transistors is called a

minimum size inverter

.

Area: 42

X 15

= 630

2

Stick diagramSlide17

17

Example 3.1 :Alternative layouts for inverter

Layout Examples

Area of both: 40

X 18

= 720

2