Scalable nanostructuring on polymer by a SiC stamp:
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Scalable nanostructuring on polymer by a SiC stamp:

optical. and . wetting. . effects. Aikaterini . Argyraki, . Weifang . Lu, . Paul Michael . Petersen, . Haiyan . Ou. Department of . Photonics. Engineering, Technical . University. of . Denmark . Outline.

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Scalable nanostructuring on polymer by a SiC stamp:




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Presentation on theme: "Scalable nanostructuring on polymer by a SiC stamp:"— Presentation transcript:

Slide1

Scalable nanostructuring on polymer by a SiC stamp: optical and wetting effects

Aikaterini

Argyraki,

Weifang

Lu,

Paul Michael

Petersen,

Haiyan

Ou

Department of

Photonics

Engineering, Technical

University

of

Denmark

Slide2

Outline

2

Technical University of Denmark

Aikaterini Argyraki

Motivation

- Wafer-Scale nanostructuring of SiC stamp

- Replication of nanostructures on a polymer surface -Optical effects -Wetting properties Conclusions

Fabrication

Characterization

Slide3

3

Technical University of Denmark

Aikaterini Argyraki

Motivation

Push performance of

devices

towards

their optimum limits by controlable fabrication of interfaces at the nanoscopic level.Polymer materials gain interest both as semiconductors

and conductors due to their

low cost

.

Slide4

PrerequisitesFabrication of nanostructures

that result in macroscale effects

with reproducibility !and….nanopattern definition must be:RapidLow-costApplicable on

wafer scale-high throughput4

Technical University of Denmark

Aikaterini Argyraki

Slide5

SiC nanostructuring: summary table

5

Type of

structuresMethodAverage Reflectance (%)

Luminecence enhancement (from 10 to 80 degrees)PeriodicE-beam1,01104%

Semi-periodicSelf-assembly1,62

67%

Periodic Semi-periodic

Technical University of Denmark Aikaterini Argyraki*Reference:Y. Ou, et al., Optics

Express 20, 7, 2012.Y. Ou, et al., Opt

. Lett. 37, 18, 2012.

Slide6

A cost

effective

method for SiC

aperiodic nanostructuring

Technical University of Denmark Aikaterini Argyraki

6

Slide7

Combinatory masking

200nm

Technical University of Denmark

Aikaterini Argyraki

7

Slide8

04-06-2013

Ramping

:

RIE

conditions

+

Al thickness

*Reference:A. Argyraki et al., Optical Materials

Express 8(3) 2013.

Slide9

Fabrication of different nanotopographies

Color

texture

changes

due to nanostructuring

9

Slide10

Optical properties: Reflection, Transmission

Technical University of Denmark

Aikaterini Argyraki

10

Average 25%

Average 5%

Average 0,5%

Average 37%

Average 33%Average 13%

Slide11

Scalability

Technical University of Denmark

Aikaterini Argyraki

11

Slide12

Summary table

12

Type of

structures

MethodAverage Reflectance (%)Luminecence enhancement (from 10 to 80

degrees)PeriodicE-beam

1,01104%Semi-periodic

Self-assembly*1,6267%StochasticCombinatory masking0,50165%

Periodic Semi-periodic Technical University of Denmark Aikaterini Argyraki

Stochastic

*Reference:

Ou, H., Advances in wide bandgap SiC for

optoelectronics, The

European Physical Journal B

Slide13

Replication of nanostructures on polymer

Technical University of Denmark

Aikaterini Argyraki

13

Process

flow

Slide14

Ni shim: generation

Technical University of Denmark

Aikaterini Argyraki

14

Slide15

Nanostructured polymer surface

Technical University of Denmark

Aikaterini Argyraki

15

Slide16

Color textures after nanostructuring on polymer

A

thin

Al

layer (~40nm)

16

Slide17

Optical and

wetting

properties after nanostructuring on polymer

68

degrees

123

degrees

Polymer-barePolymer-nano

Al coated-bareAl coated-nano75 degrees132 degreesAverage 11%Average 5%Average 3%

Average 88%Average 85%Average 33%

Slide18

ConclusionsDemonstrated 2 inch

wafer

nanostructuring on polymer by a SiC stampColor texture and transmitance

of SiC surface was controled by nanotopography appliedColor texture and reflectance of polymer surface was

significantly altered by nanostructuring and additional deposition of a thin Al layerWetting properties of surfaces shifted after

nanostructuring from hydrophilic to hydrophobic

Technical University of Denmark

Aikaterini Argyraki

18

Slide19

Acknowledgment

Technical University of Denmark

Aikaterini Argyraki

19

Weifang Lu

Yiyu Ou

Paul Michael Petersen

Haiyan Ou

Slide20

Thank you

for

your attention

Contact info: aikar@fotonik.dtu.dk

Technical University of Denmark

Aikaterini Argyraki

20