PPT-Ion Beam Lithography: Focused Ion Beam & Ion Projection Lithography

Ziam Ghaznavi CHE 384T Lithography November 30 th 2017 1 OutlineAgenda Motivation Ion Solid Interactions Overview of IBL Systems Future Outlook 2 Motivation SEMATECH and the ITRS. Albrecht . Dürer. , . Mechanical creation of a perspective image. , 1525. Overview of next two lectures. The pinhole projection model. Qualitative properties. Perspective projection matrix. Cameras with lenses. of Object Features. OBJECT FEATURES. Edges. are lines that represent the boundary. between two faces. . Corners. Represent the intersection of two or. more edges.. Edge. Corner. Edge. No edge. No corner. NANO 101. Introduction to Nanotechnology. 1. 2. Lithography. Photolithography. Electron beam lithography. X-ray lithography. Focused ion beam lithography. “Photoengraving”. Transfer pattern into reactive polymer film (“resist”). map. orthographic projection. map. orthographic projection. orthographic projection. 3D Modeling by. Orthographic Projection. Classic Isometric (3/4) View. x. 0. = 0 x. 1. = 2x x. 2. = 4x x. RATHER DRAWING. DEEPAK SAMEER JHA. LOVELY SCHOOL ENGINEERING. WHAT DO YOU UNDERSTAND LOOKING AT THE FIGURES SHOWN BELOW?. SQUARE PLANE. RECTANGULAR PLANE. CIRCULAR. DISC. C. Y. L. I. ND. E. R. C. ONE. RATHER DRAWING. DEEPAK SAMEER JHA. LOVELY SCHOOL ENGINEERING. WHAT DO YOU UNDERSTAND LOOKING AT THE FIGURES SHOWN BELOW?. SQUARE PLANE. RECTANGULAR PLANE. CIRCULAR. DISC. C. Y. L. I. ND. E. R. C. ONE. . kjetil. Lithography is the process of transferring patterns. Photolithography. Positive resist. Negative resist. X-ray lithography. E-beam lithography. Photolithography. General process: . Cleaning of wafer. Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Introduction.. Photon-based lithography: DUV (deep UV), EUV (extreme UV), X-ray. Charged-beam based lithography: electron beam, focused ion beam. Nanofabrication by molding/printing: soft lithography, nanoimprint. Electron Beam Lithography System - ELF 10000 Electron Beam Lithography System HS50 University of Illinois Urbana-Champaign to Install First 150kV Electron Beam Lithography System in North America By: Bitew Dinke Hugo Ferrer Enee416 Dr. G hodssi Definition of LIGA  LIGA is a German acronym that stands for Litho g raphie , Galvano f ormung and Ab f ormung .  When translated it me Brandon Rayhaun. Jerry Nolen. XMAT Facility. Located at the APS. Combines hard X-rays from APS with energetic heavy ion irradiation for purpose of studying materials science. Applications. Primarily studies effects of damage to fuels and cladding in nuclear reactors.