PDF-LIGA Lithography
Author : emily | Published Date : 2021-06-27
By Bitew Dinke Hugo Ferrer Enee416 Dr G hodssi Definition of LIGA LIGA is a German acronym that stands for Litho g raphie Galvano f ormung and Ab f ormung When
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LIGA Lithography: Transcript
By Bitew Dinke Hugo Ferrer Enee416 Dr G hodssi Definition of LIGA LIGA is a German acronym that stands for Litho g raphie Galvano f ormung and Ab f ormung When translated it me. FEAR AND LOATHING IN LA LIGA 831FF_tx.indd 1 03/10/2013 09:54 831FF_tx.indd 2 03/10/2013 09:54 FEAR AND LOATHING IN LA LIGA SID LOWE 831FF_tx.indd 3 03/10/2013 0 NANO 101. Introduction to Nanotechnology. 1. 2. Lithography. Photolithography. Electron beam lithography. X-ray lithography. Focused ion beam lithography. “Photoengraving”. Transfer pattern into reactive polymer film (“resist”). born: 1898 Leeuwarden, Holland. Background info. Went to school of Decorative arts in Haarlem . Switched from architecture to print making (influenced by his teacher . Samuel Jessurun de Mesquita). Nano. Imprint Lithography. Lithography. Imprint-To produce (a mark or pattern) on a surface by pressure. .. Nanoscale. Uv. - Method. This was first invented . by Prof. Stephen Chou . and his students in 1995.. . kjetil. Lithography is the process of transferring patterns. Photolithography. Positive resist. Negative resist. X-ray lithography. E-beam lithography. Photolithography. General process: . Cleaning of wafer. outline. Lithography. Introduction to EUVL. Basic concepts. Why do we need EUVL?. EUVL Process. Basic technology for EUV. EUV masks. All Reflective Optics. Advantages. Disadvantages. Conclusion. WHAT IS LITHOGRAPHY . EE 4611 . Dehua . liu. 4/8/2016. THE origin of Nanoscale Lithography. Major methods . of Nanoscale . Lithography. A. dvantages and disadvantages of different methods of Nanoscale . Lithography. Moore’s . Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Introduction.. Photon-based lithography: DUV (deep UV), EUV (extreme UV), X-ray. Charged-beam based lithography: electron beam, focused ion beam. Nanofabrication by molding/printing: soft lithography, nanoimprint. Valentin Ventura. Cost of printing in Ghent was . cheaper. than in Brussels . To . escape. from the enticing attraction of . Petite Suzanne . He pawned his jewels . in order to . pay the down payment/ . uv sveikata, ligos j prevencija ir gydymas Turinys VADAS ......................................................................................................................................... What is LIGALIGA is a process in IC fabrication which involves substrateLIGA allows structures to have heights of over 100 with respect to the lateral size LIGA fabricates High Aspect Ratio Structures NA TABANA OQO Rashid Ansorali e na Mixit Refugee Youth Arts Tabaka ko Wendy Preston1lewe ni vanua ka vakaitavi e na veika e caka e na cakacaka ni liga droini meke sere vucu buli sere kei na meke kei n
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