PPT-Northern Illinois University’s ion beam sputtering system
Author : min-jolicoeur | Published Date : 2017-06-19
for boron deposition on a CCD Donna et al 17May2013 Special thanks to Gregg Westberg NIU who is leading the effort at NIU Goal Deposit 3 um of Boron10 on the SiO
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Northern Illinois University’s ion beam sputtering system: Transcript
for boron deposition on a CCD Donna et al 17May2013 Special thanks to Gregg Westberg NIU who is leading the effort at NIU Goal Deposit 3 um of Boron10 on the SiO 2 surface of a CCD. Central Illinois is further divided into categories f or high productivity farmland and low productivity farmland Budgets re prepared to include all revenue and all financial non land costs evenue includes crop revenue government commodity paym ents Wolfgang Jacob, March 20052Chemical sputtering Aaron M. Schinder, . Prof. Mitchell . Walker, . Prof. Julian . Rimoli. High-Power . Electric Propulsion Lab. Georgia Institute of Technology . 49th AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit . 1/1/14 ACA changes… for . new. Medicaid Applicants in Illinois. “for now”.?.?.?.?. BIG CHANGE: . NO ASSET TEST FOR NEWLY ELIGIBLES . NOTE: In Illinois ALL applicants including those with disabilities are considered “newly . P. Thieberger, C. Chasman, W. Fischer, D. Gassner, X. Gu, M. Minty, A. Pikin . Speculations based on:. The . electron backscattering detector (eBSD), a new tool for the precise mutual alignment of the electron and ion beams in electron lenses* . Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Ion source and optics.. Ion-solid interaction, damage.. Scanning ion beam imaging.. FIB lithography using resist.. FIB milling, sputtering yield.. Redeposition.. Single line milling.. Other types of FIB lithographies (implantation, intermixing…).. Electron Beam Lithography System HS50 University of Illinois Urbana-Champaign to Install First 150kV Electron Beam Lithography System in North America -Champaignhttp//safetyandcompliancefsillinoisedu217-265-9828Lockout/TagoutTraining for Affected EmployeesDivision of Safety ComplianceUniversity of Illinois at Urbana-Champaignhttp//safetyandcomplian a. LIGO. Carmen S. Menoni. Electrical & Computer Engineering. Colorado State University. Collaborators: . Le Yang (Grad. Student), Mariana Fazio (post-doctoral student), Colorado State University. B. Jeanneret. ABP BB-meeting. 28. th. June 2013. Goal of the study. Evaluate the impact . of the . betatronic. divergence of . the ‘strong’ beam in the presence of a crossing angle and with considering the longitudinal distribution of the bunches (question raised by . Brandon Rayhaun. Jerry Nolen. XMAT Facility. Located at the APS. Combines hard X-rays from APS with energetic heavy ion irradiation for purpose of studying materials science. Applications. Primarily studies effects of damage to fuels and cladding in nuclear reactors.
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