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CORPORATE INSTITUTE OF SCIENCE & TECHNOLOGY , BHOPAL CORPORATE INSTITUTE OF SCIENCE & TECHNOLOGY , BHOPAL

CORPORATE INSTITUTE OF SCIENCE & TECHNOLOGY , BHOPAL - PowerPoint Presentation

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Uploaded On 2017-04-20

CORPORATE INSTITUTE OF SCIENCE & TECHNOLOGY , BHOPAL - PPT Presentation

DEPARTMENT OF ELECTRONICS amp COMMUNICATIONS NMOS FABRICATION PROCESS PROF RAKESH K JHA NMOS FABRICATION PROCESS Step1 Processing is carried on single crystal silicon of high purity on which required P impurities are introduced as crystal is grown Such wafers are about 75 to 150 mm ID: 539842

process fabrication surface nmos fabrication process nmos surface silicon areas layer photo deposited resist required wafer oxide grown poly

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