PPT-Electron-beam lithography

with the Raith EBPG Part 1 Introduction M Rooks Yale University The EBPG has a long history stretching back to the 1960s This particular ebeam system was first built by Philips in the Netherlands then was bought out by Cambridge Instruments UK which morphed into Leica Lithography spun off as . NANO 101. Introduction to Nanotechnology. 1. 2. Lithography. Photolithography. Electron beam lithography. X-ray lithography. Focused ion beam lithography. “Photoengraving”. Transfer pattern into reactive polymer film (“resist”). . kjetil. Lithography is the process of transferring patterns. Photolithography. Positive resist. Negative resist. X-ray lithography. E-beam lithography. Photolithography. General process: . Cleaning of wafer. with the . Raith. EBPG. Part 3: Hardware. M. Rooks, Yale University. EBPG 5000 System Hardware. 100 kV accelerating potential electrons of course. 20 bit main field DAC Digital to Analog Converter*. with the . Raith. EBPG. Part 3: Hardware. M. Rooks, Yale University. EBPG 5000 System Hardware. 100 kV accelerating potential electrons of course. 20 bit main field DAC Digital to Analog Converter*. Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Ziam Ghaznavi. CHE 384T Lithography. November 30. th. , 2017. 1. Outline/Agenda. Motivation. Ion – Solid Interactions. Overview of IBL Systems . Future Outlook. 2. Motivation. SEMATECH and the ITRS. Ion source and optics.. Ion-solid interaction, damage.. Scanning ion beam imaging.. FIB lithography using resist.. FIB milling, sputtering yield.. Redeposition.. Single line milling.. Other types of FIB lithographies (implantation, intermixing…).. with the . Raith. EBPG. Part . 2: Choosing parameters. M. Rooks, Yale University. Choosing e-beam exposure parameters. Step 1: choose the resist and choose the resist thickness. Typical choices:. . with the . Raith. EBPG. Part . 2: Choosing parameters. M. Rooks, Yale University. Choosing e-beam exposure parameters. Step 1: choose the resist and choose the resist thickness. Typical choices:. . Electron-beam lithography with the Raith EBPG Part 1: Introduction M. Rooks, Yale University The EBPG has a long history, stretching back to the 1960s. This particular e-beam system was first built by Philips (in the Netherlands), then was bought out by Cambridge Instruments (UK), which morphed into Leica Lithography, spun off as Introduction.. Photon-based lithography: DUV (deep UV), EUV (extreme UV), X-ray. Charged-beam based lithography: electron beam, focused ion beam. Nanofabrication by molding/printing: soft lithography, nanoimprint. Intra-beam . Scattering. Mauro Pivi, MedAustron - work made while at SLAC -. i. n . collaboration. with: T. . Demma. (Frascati & LAL), the ILC / CLIC and . Electron Beam Lithography System - ELF 10000 University of Illinois Urbana-Champaign to Install First 150kV Electron Beam Lithography System in North America